Vacuum coating industry

Core tip: continuous improvement of vacuum coating technology to create a new chapter in the application of vacuum technology in the field of film. The rapid development of film technology in the 60's also played a great push to the development of vacuum technology.

Vacuum coating method improvement of opening a new chapter in the application of vacuum technology in the field of film. The film technology in the vigorous development of 60 years of development of vacuum technology has played a great role in promoting. We see in the vacuum coating vacuum coating of the introduction to learn online information, will now compile it out for our country vacuum technology workers. This compilation release to exact information introduced in this field have contributed to the names of scientists, it is worth scientists always miss. Their achievements will also be later for vacuum field worship. The only regret is not identified by these scientists in China just behind each achievement in brackets lists the main inventor or unit name. The history of vacuum coating in China also needs to be sorted out and written by our country's people. This is very rich in content, and we will feel the rapid development of the application of vacuum coating.

119th Century

Vacuum coating has been 200 years of history. In nineteenth Century can be said to have been in the exploration and development stage. During this difficult Explorer has been fully embodied. In 1805, the relationship between the contact angle and the surface energy (Young) is studied. In 1817, a reflective film (Fraunhofer) is formed on the lens. In 1839, began to study the arc evaporation (Hare). In 1852, began to study the vacuum sputtering coating (Grove; Pulker). In 1857, the formation of thin films (Faraday; Conn) was formed by evaporation of metal wire in nitrogen. In 1874, the report was made of plasma polymer (Dewilde; Thenard). In 1877, the thin films were successfully deposited by vacuum sputtering (Wright). In 1880, hydrocarbon gas phase pyrolysis (Sawyer; Mann). In 1887, thin film vacuum evaporation (Gan Guo) (Nahrwold; Pohl; Pringsheim). In 1896, the chemical process of forming the anti reflective film has begun to be developed. In 1897, the study successfully four hydrogen chloride hydrogen reduction method (CVD); film thickness of the optical interference measurement method (Wiener).

The first 50 years of 220th Century

In 1904, the silver plated on the cylinder was patented (Edison). In 1907, began to study the vacuum reactive evaporation technology (Soddy). In 1913, adsorption isotherms were studied (Langmuir, Knudsen, Knacke, etc.). In 1917, the films deposited on glass rods were deposited by sputtering. In 1920, the study of sputtering theory (Guntherschulzer). In 1928, the vacuum evaporation of tungsten wire (Ritsehl, Cartwright). In 1930, the formation of ultrafine particles (Pfund) was formed by vacuum vapor phase evaporation. In 1934, Kurz, (Whiley), a thin film deposited on a semi transparent glass sheet, plasma cleaning (Bauer, Strong). In 1935, the success in metallized paper capacitor Cd:Mg and Zn of vacuum evaporation coil coating of Bausch and Mansbridge; Paloma 100 inch telescope mirror aluminized (strong); optical lens on the plating of single-layer antireflection coating (strong and smakula); metal film morphology research (Andrade, Matindale). In 1937, the development of a sealed beam head with a lead reflector (Wright) was successfully developed (Whiley); the successful development of the magnetron enhanced sputtering deposition (Penning). In 1938, the ion bombardment surface after evaporation to obtain a patent (Berghaus). In 1939, the double layer anti reflective coating system (Cartwright, Turner). In 1941, aluminum net made of metal foil for radar. In 1942, the three layer of the film deposition system (Geffcken); isotope separation with the metal ion source developed successfully. In 1944, the electronic cleaning of glass was successfully developed (Rice, Dimmick). In 1945, the development of multilayer optical filters (Banning, Hoffman). In 1946, the thickness of the thin film (Friedman, Birks) was measured by X - ray absorption method. The British Goodfellow company was established. In 1947, the 200 inch telescope mirror aluminum success. In 1948, the United States National Optical laboratory (OCLI) was established; the deposition of particles in the vacuum rapid evaporation (Harris, Siegel); the use of light transmittance to control the thickness of the film (Dufour). In 1949, the growth pattern of non metallic film (Schulz). In 1950, sputtering theory began to establish (Wehner); semiconductor industry started; a variety of microelectronic industry started; cold mirror developed (Turner, Hoffman, Schroder); plastic decorative film began to appear (Holland).

In the last 50 years of 320th Century

This is the 50 year of the film technology to take off. The development of vacuum measurement and vacuum measurement is the decisive factor for the rapid industrialization of thin film technology. In 1952, the surface automatic cleaning method was developed, and the new reactive evaporation method (Auwarter, Brinsmaid) was started to study the corrosion resistance of plasma polymer films. In 1953, the American Vacuum Society was founded; the film material (3M) was prepared by the method of winding film coating. In 1954, began to develop a new type of vacuum evaporation film winding machine (Leybold company). 1955, thin films deposited by the electron beam evaporation technique began to mature (Ruhle); the beginning of the dielectric radio frequency sputtering method (Wehner) was proposed. In 1956, the United States on the first surface coated with a metal film of the car come out (Ford Motor Company). 1957, vacuum plating method CD accepted by aviation industry; Study on optical film reaction evaporation method (Brismaid, Auwarter); the American society was founded in.1958 vacuum coating, thin film epitaxial growth technology developed (Gunther); the National Aeronautics and Space Administration (NASA) was established in.1959, the successful development of Temescal (magnetic tape plating equipment company).1960, appeared polymer surface plasma deposition method of (Sharp, Schorhorm); electric propulsion with the successful development of ion source (Kauffman); quartz crystal film thickness measuring instrument is developed in.1961, low radiation rate glass developed (Leybold); to study the sputtering yield elements (Laegried, Yamamura etc.).1962, began to study for chemical analysis of sputtering method; carbon (Massey) and metal (Lucas) arc vapor deposition.