What is the evaporation system detailed vacuum coating machine?

 Vacuum evaporation coater system mainly refers to the membrane device, coating machine of film forming apparatus many, resistance heating, electron gun evaporation, magnetron sputtering, RF magnetron sputtering and ion plating in a variety of ways, I will resistance heating and evaporation by the electron gun in two ways, because the way I use more.

Based on its structure and working principle, resistance evaporation is the most widely used method, and it is also the most widely used method. Evaporation due to melting point higher than the heat in its work, the tungsten sheet is made into a boat shaped, and then installed in the two intermediate electrode tungsten boat central herbs, and then slowly to the electrode is energized, the current through the tungsten boat, tungsten boat through electric heating, the low voltage, large current, the high melting point of tungsten boat to generate heat and reheat guide to coating material, when tungsten boat coating material, material sublimation and evaporation, this method is easy to operate, the structure is simple, the cost is low, so it is a lot of equipment application, but the evaporation of thin films because of the dense is poor, and a lot of material can not be used this way, so it has certain limitations. Tungsten boat evaporation coating material, the melting point of the material must be less than the melting point of tungsten boat, otherwise there is no way to carry out.

The electron gun evaporation coating machine is a kind of evaporation so far the most widely used, it can evaporate any kind of coating material, the way it works is: the coating material in the crucible, the evaporation source is made into filament shape, with a special control cabinet, the filament plus a high current, high voltage and because the filament material is tungsten, so it may have a fever, to the end will emit electrons with a certain magnetic field to gather a certain shape, and the traction to the crucible, thus forming an electron beam, the electron beam temperature is very high, can melt any coating when the coating film is electronic medicinal herbs, after the beam melting (some material is directly sublimed), drug molecules (atoms or ions) into linear motion in a vacuum, and then encounter substrate condensation down, through this way of growth , forming thin film! The most commonly used to make the deflection angle of the electron beam into 270 degrees, or running track for the E type of e electron gun or electron beam deflection angle of 180 degrees, running track for the C type of C type electron gun two kinds.

Electron beam evaporation, the biggest advantage is: electron beam spot can be adjusted freely, can be a gun, filament can be hidden, avoid pollution can arbitrary evaporation coating materials, and the maintenance is convenient, the evaporation rate can be free to control, and material decomposition, high density of the membrane. Good mechanical strength.

Sputtering is with a high positive ion bombardment of the target surface. Through the kinetic energy transmission. The order of the target molecular (atomic) enough energy to escape from the surface of the target, the surface of the product in the condensed to form a thin film.

Sputtering plating film adhesion strong, high purity thin films can be simultaneous sputtering of various components of material, but the high requirements of the target, not like the electron gun as resource conservation.

At present, the use of most of the magnetron sputtering coater, magnetron sputtering is refers to the parallel to the surface of the cathode Shi strong electric field, will constrain electrons near the surface of the cathode target, improve the ionization efficiency. It is one of the most simple operation, so the use of a very wide.